Cover of Anton A. Kiss (EDT), Edwin Zondervan (EDT), Richard Lakerveld (EDT), Leyla Ozkan (EDT): 29th European Symposium on Computer Aided Chemical Engineering

Anton A. Kiss (EDT), Edwin Zondervan (EDT), Richard Lakerveld (EDT), Leyla Ozkan (EDT) 29th European Symposium on Computer Aided Chemical Engineering

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Elsevier Science

2019

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1892

978-0-12-818635-0

0-12-818635-6

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The 29th European Symposium on Computer Aided Process Engineering, contains the papers presented at the 29th European Symposium of Computer Aided Process Engineering (ESCAPE) event held in Eindhoven, The Netherlands, from June 16-19, 2019. It is a valuable resource for chemical engineers, chemical process engineers, researchers in industry and academia, students, and consultants for chemical industries. Presents findings and discussions from the 29th European Symposium of Computer Aided Process Engineering (ESCAPE) event

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